Citation

Imazono T, Hirayama Y, Ichikura S, Kitakami O, Yanagihara M, Watanabe M. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 2004; 43(7 A): 4327-4333.

Copyright

(Copyright © 2004)

DOI

10.1143/JJAP.43.4327

PMID

unavailable

Abstract

We measured the Si L2,3 fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe suicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe suicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.

Language: en

Keywords

Temperature; Silicon; X ray diffraction; X ray photoelectron spectroscopy; Transmission electron microscopy; Interface; Stoichiometry; Fluorescence; Iron; Interdiffusion (solids); Magnetron sputtering; Synchrotron radiation; Ferromagnetic materials; Interlayer coupling; Curve fitting; Fe/Si multilayer; Interdiffusion; Magnetic exchange coupling; Soft x-ray fluorescence; Soft X-ray fluorescence; X-ray reflection