Citation

Pang CH, Hing P, Zhao FF, See A, Chong YF, Lee PS. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 2004; 22(1): 122-128.

Copyright

(Copyright © 2004)

DOI

10.1116/1.1636158

PMID

unavailable

Abstract

The evolution of surface roughness during metal silicides phase transformation and coupling was discussed. The correlation of surface roughness with sheet resistance, film thickness and phase transformation were also studied. The results show that during metal/silicon reaction film surface roughness is due to the effect of nucleation and growth of metal silicides. It was also found that surface roughness increases as new phase are formed and decreases during grain growth.

Language: en

Keywords

Silicon compounds; Sheet resistance; Interfaces (materials); Film growth; Phase formation; Phase transitions; Nucleation; Antiferromagnetism; Atomic force microscopy; Surface roughness; Grain growth; Metallizing