Article Title,Year,Volume,Issue,Page Range,Author
Abnormal oxidation of nickel silicide on N-type substrate and effect of preamorphization implantation,2004,43,10,6998-6999,Yun
Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology,2004,43,1,91-95,Lee
Electroluminescence and Response Characterization of β-FeSi 2-Based Light-Emitting Diodes,2004,43,2 A,L154-L156,Chu
Effect of phase formation behavior on thermal stability of hafnium-based thin films for copper interconnects,2004,43,6 A,3340-3345,Lin
Interdiffused layers in antiferromagnetically coupled Fe/Si multilayers studied by soft-X-ray fluorescence spectroscopy,2004,43,7 A,4327-4333,Watanabe
Selective silicidation of Co using silane or disilane for anti-oxidation barrier layer in Cu metallization,2004,43,9 A,6001-6007,Noda
Time-Resolved 1.5 μm-Band Photoluminescence of Highly Oriented β-FeSi2 Films Prepared by Magnetron-Sputtering Deposition,2004,43,2 A,L127-L129,Chu