TY  - JOUR
PY  - 1993//
TI  - Pulsed laser melting and resolidification of metal silicide layers
JO  - International Journal of Thermophysics
A1  - Baeri, P.
A1  - Grimaldi, M.G.
A1  - La Via, F.
A1  - Spinella, C.
A1  - Spoto, G.
SP  - 383
EP  - 396
VL  - 14
IS  - 3
N2  - Ti, Fe, and Co silicide layers, 80-200 nm thick, on top of single crystal silicon substrate have been melted by 25-ns ruby laser pulses and the resolidified structures have been analyzed by transmission electron microscopy, X-ray diffraction, and Rurtherford backscattering spectrometry. Metastable phases and/or epitaxial layers are obtained upon solidifcation. The transient molten layer has been monitored by means of time-resolved optical measurements with nanosecond resolution; in all cases solidification velocity of the order of 1 m · s-1 was observed, and in one case liquid undercooling as much as 800 K was estimated. © 1993 Plenum Publishing Corporation.<p /> <p>Language: en</p>
LA  - en
SN  - 1572-9567
UR  - http://dx.doi.org/10.1007/BF00566038
ID  - ref1
ER  -