TY  - JOUR
PY  - 2000//
TI  - Chromium as an antidiffusion interlayer in higher manganese silicide-nickel contacts
JO  - Technical Physics
A1  - Petrova, L.I.
A1  - Dudkin, L.D.
A1  - Khlomov, V.S.
A1  - Fedorov, M.I.
A1  - Zaǐtsev, V.K.
A1  - Solomkin, F.Yu.
SP  - 641
EP  - 643
VL  - 45
IS  - 5
N2  - The interaction of higher manganese suicide (MnSi1.71-1.75) with nickel and chromium was investigated. A chromium layer was shown to inhibit nickel diffusion into suicide more than four times. The use of the chromium layer made it possible to improve the mechanical and electrical properties of silicide-nickel contacts. © 2000 MAIK "Nauka/Interperiodica".<p /> <p>Language: en</p>
LA  - en
SN  - 1063-7842
UR  - http://dx.doi.org/10.1134/1.1259692
ID  - ref1
ER  -