@article{ref1,
title="Pulsed laser melting and resolidification of metal silicide layers",
journal="International Journal of Thermophysics",
year="1993",
author="Baeri, P. and Grimaldi, M.G. and La Via, F. and Spinella, C. and Spoto, G.",
volume="14",
number="3",
pages="383-396",
abstract="Ti, Fe, and Co silicide layers, 80-200 nm thick, on top of single crystal silicon substrate have been melted by 25-ns ruby laser pulses and the resolidified structures have been analyzed by transmission electron microscopy, X-ray diffraction, and Rurtherford backscattering spectrometry. Metastable phases and/or epitaxial layers are obtained upon solidifcation. The transient molten layer has been monitored by means of time-resolved optical measurements with nanosecond resolution; in all cases solidification velocity of the order of 1 m · s-1 was observed, and in one case liquid undercooling as much as 800 K was estimated. © 1993 Plenum Publishing Corporation.<p /><p>Language: en</p>",
language="en",
issn="1572-9567",
doi="10.1007/BF00566038",
url="http://dx.doi.org/10.1007/BF00566038"
}