@article{ref1,
title="Nitrogen irradiation of Fe/Si bilayers: Nitride versus suicide phase formation",
journal="Applied Physics A: Materials Science and Processing",
year="2004",
author="Milinovic, V. and Bibic, N. and Dhar, S. and Siljegovic, M. and Schaaf, P. and Lieb, K.P.",
volume="79",
number="8",
pages="2093-2097",
abstract="In the course of a systematic investigation of heavy ion-irradiated Fe/Si layers, we have studied atomic transport and phase formation induced by 22-keV 14N2+ ion implantation in 57Fe(30 nm)/Si bilayers at high fluences. We report here results obtained by Rutherford backscattering spectroscopy, X-ray diffraction, and conversion electron Mössbauer spectroscopy after implantation and post-implantation annealing treatments. The irradiations caused little sputtering, but significant interface mixing. During implantation, iron nitrides, but no silicides were formed, even at the highest nitrogen fluence of 2 × 1017 ions/cm 2. When heating these samples in vacuo up to 700°C, the iron-rich phases ε-Fe3N and γ-Fe4N were produced. Starting at 600°C the suicide phase β-FeSi2 was also identified.<p /><p>Language: en</p>",
language="en",
issn="0947-8396",
doi="10.1007/s00339-004-2889-2",
url="http://dx.doi.org/10.1007/s00339-004-2889-2"
}